The Modeling of Lpcvd in Single-wafer Reactors as a Tool for Process Optimization and Equipment Design
نویسنده
چکیده
An overview is given of the modeling of the hydrodynamics, transport phenomena and chemical reactions in single-wafer LPCVD reactors, both at the macroscopic (reactor-scale) and a t the microscopic (feature-scale) level. Examples of modeling results f o r single-wafer silicon LPCVD from silane and tungsten LPCVD from tungsten hexafluoride and hydrogen a r e presented and comparisons a r e made with experimental results. The use of mathematical models in the design and optimization of single-wafer LPCVD reactors and processes is discussed.
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